검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms Posseme N, Chevolleau T, Bouyssou R, David T, Arnal V, Barnes JP, Verove C, Joubert O Journal of Vacuum Science & Technology B, 28(4), 809, 2010 |
| 2 |
45 nm node back end of the line yield evaluation on ultrahigh density interconnect structures using electron beam direct write lithography Icard B, Pain L, Arnal V, Manakli S, Le-Denmat JC, Brun P, Vincent M, Soonkindt C, Minghetti B, Matsumiya T Journal of Vacuum Science & Technology B, 25(1), 124, 2007 |