| 1 |
Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
You SH, Kim JH, Kim CK
Korean Journal of Chemical Engineering, 39(1), 63, 2022 |
| 2 |
Stabilizing color shift of tandem white organic light-emitting diodes
Cho HS, Song JO, Kwon BH, Choi SY, Lee HK, Joo CW, Ahn SD, Kang SY, Yoo SH, Moon JH
Journal of Industrial and Engineering Chemistry, 69, 414, 2019 |
| 3 |
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether
Kim JH, Park JS, Kim CK
Thin Solid Films, 669, 262, 2019 |
| 4 |
Angular Dependence of Si3N4 Etching in C4F6/CH2F2/O-2/Ar Plasmas
Kim JH, Cho SW, Kim CK
Chemical Engineering & Technology, 40(12), 2251, 2017 |
| 5 |
Fabrication of wide angle structural color with the patchy multi-bilayered films
Kim S, Iwakiri T, Yagi R, Ogata T, Kurihara S
Molecular Crystals and Liquid Crystals, 644(1), 36, 2017 |
| 6 |
Angular dependences of SiO2 etch rates at different bias voltages in CF4, C2F6, and C4F8 plasmas
Kim JH, Cho SW, Park CJ, Chae H, Kim CK
Thin Solid Films, 637, 43, 2017 |
| 7 |
Angular reflection study to reduce plasmonic losses in the dielectrically displaced back reflectors of silicon solar cells
Yang Y, Pillai S, Kampwerth H, Green MA, Mehrvarz H, Ho-Baillie A
Solar Energy Materials and Solar Cells, 117, 343, 2013 |
| 8 |
Energy and angular dependence of the sputter yield and ionization yield of Ge bombarded by O-2(+)
Huyghebaert C, Conard T, Vandervorst W
Applied Surface Science, 231-2, 693, 2004 |
| 9 |
An analysis of absorbed radiation by domed and vaulted roofs as compared with flat roofs
Runsheng T, Meir IA, Etzion Y
Energy and Buildings, 35(6), 539, 2003 |
| 10 |
Basis sets and active space in multiconfigurational self-consistent field calculations of nuclear magnetic resonance spin-spin coupling constants
Guilleme J, San Fabian J
Journal of Chemical Physics, 109(19), 8168, 1998 |
