검색결과 : 20건
| No. | Article |
|---|---|
| 1 |
X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films Lenhart JL, Fischer DA, Sambasivan S, Lin EK, Jones RL, Soles CL, Wu WL, Goldfarb DL, Angelopoulos M Langmuir, 21(9), 4007, 2005 |
| 2 |
Formation of deprotected fuzzy blobs in chemically amplified resists Jones RL, Hu TJ, Lin EK, Wu WL, Goldfarb DL, Angelopoulos M, Trinque BC, Schmid GM, Stewart MD, Willson CG Journal of Polymer Science Part B: Polymer Physics, 42(17), 3063, 2004 |
| 3 |
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes Goldfarb DL, Mahorowala AP, Gallatin GM, Petrillo KE, Temple K, Angelopoulos M, Rasgon S, Sawin HH, Allen SD, Lawson MC, Kwong RW Journal of Vacuum Science & Technology B, 22(2), 647, 2004 |
| 4 |
Interfacial effects on moisture absorption in thin polymer films Vogt BD, Soles CL, Jones RL, Wang CY, Lin EK, Wu WL, Satija SK, Goldfarb DL, Angelopoulos M Langmuir, 20(13), 5285, 2004 |
| 5 |
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends Jablonski EL, Prabhu VM, Sambasivan S, Lin EK, Fischer DA, Goldfarb DL, Angelopoulos M, Ito H Journal of Vacuum Science & Technology B, 21(6), 3162, 2003 |
| 6 |
Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations Lenhart JL, Jones RL, Lin EK, Soles CL, Wu WL, Goldfarb DL, Angelopoulos M Journal of Vacuum Science & Technology B, 20(2), 704, 2002 |
| 7 |
Probing surface and bulk chemistry in resist films using near edge X-ray absorption fine structure Lenhart JL, Jones RL, Lin EK, Soles CL, Wu WL, Fischer DA, Sambasivan S, Goldfarb DL, Angelopoulos M Journal of Vacuum Science & Technology B, 20(6), 2920, 2002 |
| 8 |
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse (vol 18, pg 3313, 2000) Goldfarb DL, de Pablo JJ, Nealey PF, Simons JP, Moreau WM, Angelopoulos M Journal of Vacuum Science & Technology B, 19(2), 600, 2001 |
| 9 |
Thin film confinement effects on the thermal properties of model photoresist polymers Soles CL, Lin EK, Lenhart JL, Jones RL, Wu WL, Goldfarb DL, Angelopoulos M Journal of Vacuum Science & Technology B, 19(6), 2690, 2001 |
| 10 |
Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists Goldfarb DL, Angelopoulos M, Lin EK, Jones RL, Soles CL, Lenhart JL, Wu WL Journal of Vacuum Science & Technology B, 19(6), 2699, 2001 |