1 |
Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature Noborisaka M, Horikoshi R, Nagashima S, Shirakura A, Suzuki T Thin Solid Films, 527, 114, 2013 |
2 |
Gas barrier properties of hydrogenated amorphous carbon films coated on polyethylene terephthalate by plasma polymerization in argon/n-hexane gas mixture Polonskyi O, Kylian O, Petr M, Choukourov A, Hanus J, Biederman H Thin Solid Films, 540, 65, 2013 |
3 |
Control of wettability of hydrogenated amorphous carbon thin films by laser-assisted micro- and nanostructuring Pfleging W, Kohler R, Torge M, Trouillet V, Danneil F, Stuber M Applied Surface Science, 257(18), 7907, 2011 |
4 |
Effect of DLC surface texturing on friction and wear during lubricated sliding Chouquet C, Gavillet J, Ducros C, Sanchette F Materials Chemistry and Physics, 123(2-3), 367, 2010 |
5 |
Electrochemical behavior of amorphous metal-silicon-carbon nanocomposites based on titanium or tungsten nanophase Pleskov YV, Krotova MD, Shupegin ML, Bozhko AD Electrochimica Acta, 54(7), 2131, 2009 |
6 |
Electrochemical determination of corrosion protection ability of fullerene thin films treated by radiofrequency plasma Sittner E, Enders B, Ensinger W Thin Solid Films, 459(1-2), 233, 2004 |
7 |
Study of CN films synthesized by facing target sputtering Wang Y, Jiang EY, Bai HL, Wu P Journal of Vacuum Science & Technology A, 17(6), 3308, 1999 |
8 |
Processing of diamondlike carbon using plasma immersion ion deposition Lee DH, Walter KC, Nastasi M Journal of Vacuum Science & Technology B, 17(2), 818, 1999 |
9 |
Investigation of the valence band states of reactively sputtered carbon nitride films Monclus MA, Cameron DC, Chowdhury AKMS, Barkley R, Collins M Thin Solid Films, 355-356, 79, 1999 |
10 |
Semiquantitative subplantation model for low energy ion interactions with surfaces. II. Ion beam deposition of carbon and carbon nitride Marton D, Boyd KJ, Rabalais JW, Lifshitz Y Journal of Vacuum Science & Technology A, 16(2), 455, 1998 |