검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Hydrogen plasma removal of post-RIE residue for backend processing Somashekhar A, Ying H, Smith PB, Aldrich DB, Nemanich RJ Journal of the Electrochemical Society, 146(6), 2318, 1999 |
| 2 |
Silicide Formation and Stability of Ti/SiGe and Co/Sice Wang ZH, Aldrich DB, Chen YL, Sayers DE, Nemanich RJ Thin Solid Films, 270(1-2), 555, 1995 |