화학공학소재연구정보센터
검색결과 : 20건
No. Article
1 Macropore Formation and Pore Morphology Characterization of Heavily Doped p-Type Porous Silicon
Martin-Sanchez D, Ponce-Alcantara S, Martinez-Perez P, Garcia-Ruperez J
Journal of the Electrochemical Society, 166(2), B9, 2019
2 Thermo-Optic Coefficient of Porous Silicon in the Infrared Region and Oxidation Process at Low Temperatures
Martin-Sanchez D, Kovylina M, Ponce-Alcantara S, Garcia-Ruperez J
Journal of the Electrochemical Society, 166(6), B355, 2019
3 A Tool for Predicting the Dynamic Response of Biotrickling Filters for VOC Removal
San-Valero P, Alcantara S, Penya-Roja JM, Alvarez-Hornos FJ, Gabaldon C
Chemical Engineering Communications, 203(4), 476, 2016
4 Physically-based simulation of zinc oxide thin-film transistors: Contact resistance contribution on density of states
Dominguez MA, Alcantara S, Soto S
Solid-State Electronics, 120, 41, 2016
5 Impact of active layer thickness in thin-film transistors based on Zinc Oxide by ultrasonic spray pyrolysis
Dominguez MA, Flores F, Luna A, Martinez J, Luna-Lopez JA, Alcantara S, Rosales P, Reyes C, Orduna A
Solid-State Electronics, 109, 33, 2015
6 Mechanically Tunable, Self-Adjuvanting Nanoengineered Polypeptide Particles
Cui JW, De Rose R, Best JP, Johnston APR, Alcantara S, Liang K, Such GK, Kent SJ, Caruso F
Advanced Materials, 25(25), 3468, 2013
7 H-infinity control of fractional linear systems
Padula F, Alcantara S, Vilanova R, Visioli A
Automatica, 49(7), 2276, 2013
8 PID control in terms of robustness/performance and servo/regulator trade-offs: A unifying approach to balanced autotuning
Alcantara S, Vilanova R, Pedret C
Journal of Process Control, 23(4), 527, 2013
9 Generalized Internal Model Control for Balancing Input/Output Disturbance Response
Alcantara S, Pedret C, Vilanova R, Skogestad S
Industrial & Engineering Chemistry Research, 50(19), 11170, 2011
10 IMC-like analytical H-infinity design with S/SP mixed sensitivity consideration: Utility in PID tuning guidance
Alcantara S, Zhang WD, Pedret C, Vilanova R, Skogestad S
Journal of Process Control, 21(4), 554, 2011