화학공학소재연구정보센터
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No. Article
1 Two-Facing-Targets (TFT) 스퍼터링장치를 이용하여 증착한 AlN박막의 잔류응력 측정
한창석, 권용준
Korean Journal of Materials Research, 31(12), 697, 2021
2 Growth of high quality AlN films on CVD diamond by RF reactive magnetron sputtering
Chen LX, Liu H, Liu S, Li CM, Wang YC, An K, Hua CY, Liu JL, Wei JJ, Hei LF, Lv FX
Applied Surface Science, 431, 152, 2018
3 Structural, mechanical and piezoelectric properties of polycrystalline AlN films sputtered on titanium bottom electrodes
Patru M, Isac L, Cunha L, Martins P, Lanceros-Mendez S, Oncioiu G, Cristea D, Munteanu D
Applied Surface Science, 354, 267, 2015
4 Structure and electrical properties of AlN films prepared on PZT layers with different orientations
Meng XQ, Yang CT, Yang JC
Journal of Crystal Growth, 386, 57, 2014
5 The effect of geometry and post-annealing on surface acoustic wave characteristics of AlN thin films prepared by magnetron sputtering
Phan DT, Chung GS
Applied Surface Science, 257(20), 8696, 2011
6 AlN:Cr thin films synthesized by pulsed laser deposition: Studies by X-ray diffraction and spectroscopic ellipsometry
Szekeres A, Bakalova S, Grigorescu S, Cziraki A, Socol G, Ristoscu C, Mihailescu IN
Applied Surface Science, 255(10), 5271, 2009
7 AlN thin films deposited by pulsed laser ablation, sputtering and filtered arc techniques
Bathe R, Vispute RD, Habersat D, Sharma RP, Venkatesan T, Scozzie CJ, Ervin M, Geil BR, Lelis AJ, Dikshit SJ, Bhattacharya R
Thin Solid Films, 398-399, 575, 2001
8 Spectrophotometric analysis of aluminum nitride thin films
Joo HY, Kim HJ, Kim SJ, Kim SY
Journal of Vacuum Science & Technology A, 17(3), 862, 1999
9 Simulation of thermionic emission from aluminum gallium nitride cathodes at elevated temperatures
Hatfield CW, Bilbro GL
Journal of Vacuum Science & Technology B, 17(5), 1987, 1999
10 Preparation of Compositionally Gradient Ti-Tin Films by RF Reactive Sputtering
Inoue S, Ucihda H, Takeshita K, Koterasawa K, Howson RP
Thin Solid Films, 261(1-2), 115, 1995