화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Development of a new condensation model for the nearly-horizontal heat exchanger tube under the steam flowing conditions
Ahn TH, Yun BJ, Jeong JJ, Kang KH, Park YS, Cheon J, Jerng DW
International Journal of Heat and Mass Transfer, 79, 876, 2014
2 Effect of boron dose and post-thermal budget on electrical properties of MOS-capacitors with a W/WNx/poly-Si1-xGex gate stack
Kang SK, Min BG, Kim JJ, Ko DH, Kang HB, Yang CW, Ahn TH
Journal of the Electrochemical Society, 151(1), G67, 2004
3 Physical and electrical properties of W/WNx/poly-Si1-xGex (x = 0, 0.2, 0.6) gates stack with post-thermal process
Kang SK, Min BG, Kim JJ, Ko DH, Kang HB, Yang CW, Lim KY, Ahn TH
Journal of the Electrochemical Society, 151(1), G71, 2004
4 Preparation and characterization of poly(ether ester) thermoplastic elastomers containing the 2,6-naphthalenedicarboxyl group
Ahn TH, Park YH, Kim SH, Baik DH
Journal of Applied Polymer Science, 90(13), 3473, 2003
5 Properties of polycrystalline Si1-xGex films grown by ultrahigh vacuum CVD using Si2H6 and GeH4
Kang SK, Kim JJ, Ko DH, Kang HB, Yang CW, Ahn TH, Yeo IS, Lee TW, Lee YH
Journal of the Electrochemical Society, 150(3), G167, 2003
6 Effects of Ge content on the oxidation behavior of poly-Si1-xGex layers for gate electrode application
Ahn TH, Yee IS, Kim TK, Joo MS, Kim HS, Kim JJ, Joung JH, Park JW
Journal of the Electrochemical Society, 148(2), G50, 2001
7 Novel technique to enhance etch selectivity of carbon antireflective coating over photoresist based on O-2/CHF3/Ar gas chemistry
Hong J, Jeon JS, Kim YB, Min GJ, Ahn TH
Journal of Vacuum Science & Technology A, 19(4), 1379, 2001
8 Wet oxidation behaviors of polycrystalline Si1-xGex films
Kang SK, Ko DH, Lee KC, Lee TW, Lee YH, Ahn TH, Yeo IS, Oh SH, Park CG
Journal of Vacuum Science & Technology A, 19(4), 1617, 2001
9 Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contact
Kim J, Shin KS, Park WJ, Kim YJ, Kang CJ, Ahn TH, Moon JT
Journal of Vacuum Science & Technology A, 19(4), 1835, 2001
10 High temperature platinum etching using Ti mask layer
Kim HW, Ju BS, Nam BY, Yoo WJ, Kang CJ, Ahn TH, Moon JT, Lee MY
Journal of Vacuum Science & Technology A, 17(4), 2151, 1999