화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Profile control of high aspect ratio trenches of silicon. II. Study of the mechanisms responsible for local bowing formation and elimination of this effect
Boufnichel M, Aachboun S, Lefaucheux P, Ranson P
Journal of Vacuum Science & Technology B, 21(1), 267, 2003
2 Profile control of high aspect ratio trenches of silicon. I. Effect of process parameters on local bowing
Boufnichel M, Aachboun S, Grangeon F, Lefaucheux P, Ranson P
Journal of Vacuum Science & Technology B, 20(4), 1508, 2002
3 Study of a mechanically clamped cryo-chuck device in a high density plasma for deep anisotropic etching of silicon
Hibert C, Aachboun S, Boufnichel M, Ranson P
Journal of Vacuum Science & Technology A, 19(2), 646, 2001
4 Cryogenic etching of deep narrow trenches in silicon
Aachboun S, Ranson P, Hilbert C, Boufnichel M
Journal of Vacuum Science & Technology A, 18(4), 1848, 2000
5 Deep anisotropic etching of silicon
Aachboun S, Ranson P
Journal of Vacuum Science & Technology A, 17(4), 2270, 1999