화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Dual-Plasma Reactor for Low-Temperature Deposition of Wide Band-Gap Silicon Alloys
Etemadi R, Godet C, Perrin J, Drevillon B, Huc J, Parey JY, Rostaing JC, Coeuret F
Journal of Vacuum Science & Technology A, 15(2), 320, 1997
2 Deposition Mechanism of Silicon-Nitride in Direct Photoassisted Chemical-Vapor-Deposition Using a Low-Pressure Hg Lamp
Yoshimoto M, Takubo K, Ohtsuki T, Komoda M, Matsunami H
Journal of the Electrochemical Society, 142(6), 1976, 1995
3 Mass-Spectrometric Studies of Remote Helium Plasma Dissociation of Silane
Jasinski JM
Journal of Vacuum Science & Technology A, 13(4), 1935, 1995
4 Modeling of Silicon-Nitride Deposition by RF Plasma-Enhanced Chemical-Vapor-Deposition
Masi M, Besana G, Canzi L, Carra S
Chemical Engineering Science, 49(5), 669, 1994
5 RESEARCH TO IMPROVE THE QUALITY OF HAZARD AND RISK ASSESSMENT FOR MAJOR CHEMICAL HAZARDS
NUSSEY C
Journal of Loss Prevention in The Process Industries, 7(2), 175, 1994