| 1 |
전자 사이클로트론 공명 플라즈마와 열 원자층 증착법으로 제조된 Al2O3 박막의 물리적·전기적 특성 비교
양대규, 김양수, 김종헌, 김형도, 김현석
Korean Journal of Materials Research, 27(6), 295, 2017 |
| 2 |
Atomic layer deposition of copper sulfide thin films
Schneider N, Lincot D, Donsanti F
Thin Solid Films, 600, 103, 2016 |
| 3 |
Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)(2)(N-iPr-amd) precursor for a high permittivity gate dielectric
Lee JS, Kim WH, Oh IK, Kim MK, Lee G, Lee CW, Park J, Lansalot-Matras C, Noh W, Kim H
Applied Surface Science, 297, 16, 2014 |
| 4 |
ALD법으로 성장한 HfO2 박막의 열처리에 따른 특성변화
이재웅, 함문호, 맹완주, 김형준, 명재민
Korean Journal of Materials Research, 17(2), 96, 2007 |
| 5 |
Construction of an atomic layer deposition system for nano-device applications
Noh SJ, Lee SK, Kim EH, Kong YJ
Current Applied Physics, 6(2), 171, 2006 |
| 6 |
Surface reaction kinetics of metal beta-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
Van TT, Chang JP
Applied Surface Science, 246(1-3), 250, 2005 |
| 7 |
Characterization of aluminum and titanium oxides deposited on 4H SiC by atomic layer deposition technique
Wolborski M, Bakowski M, Pore V, Ritala M, Leskela M, Schoner A, Hallen A
Materials Science Forum, 483, 701, 2005 |
| 8 |
Effect of annealing in processing of strontium titanate thin films by ALD
Kosola A, Putkonen M, Johansson LS, Niinisto L
Applied Surface Science, 211(1-4), 102, 2003 |
| 9 |
Preparation, characterization and activity testing of vanadia catalysts deposited onto silica and alumina supports by atomic layer deposition
Keranen J, Auroux A, Ek S, Niinisto L
Applied Catalysis A: General, 228(1-2), 213, 2002 |
