| 1 |
Low-temperature deposition of highly textured aluminum nitride by direct current magnetron sputtering for applications in thin-film resonators
Naik RS, Reif R, Lutsky JJ, Sodini CG
Journal of the Electrochemical Society, 146(2), 691, 1999 |
| 2 |
Electrical properties of AlN thin films deposited at low temperature on Si(100)
Aardahl CL, Rogers JW, Yun HK, Ono Y, Tweet DJ, Hsu ST
Thin Solid Films, 346(1-2), 174, 1999 |
| 3 |
Synthesis of Al(N-3)(3) and the Deposition of AlN Thin-Films
Linnen CJ, Macks DE, Coombe RD
Journal of Physical Chemistry B, 101(9), 1602, 1997 |
| 4 |
AlN Thin-Film Deposition by Pulsed-Laser Ablation of Al in NH3
Guidoni AG, Mele A, Dipalma TM, Flamini C, Orlando S
Thin Solid Films, 295(1-2), 77, 1997 |
| 5 |
Reactive Low-Voltage Ion Plating of Aluminum Nitride Films and Their Characteristics
Danh NQ, Monz KH, Pulker HK
Thin Solid Films, 257(1), 116, 1995 |
| 6 |
Low-Temperature Growth of RF Reactively Planar Magnetron-Sputtered AlN Films
Penza M, Dericcardis MF, Mirenghi L, Tagliente MA, Verona E
Thin Solid Films, 259(2), 154, 1995 |
| 7 |
Hydrogenated Aluminum Nitride Thin-Films Prepared by RF Reactive Sputtering - Infrared and Structural-Properties
Loretz JC, Despax B, Marti P, Mazel A
Thin Solid Films, 265(1-2), 15, 1995 |
| 8 |
Optical-Properties of Sputter-Deposited Aluminum Nitride Films on Silicon
Legrand PB, Wautelet M, Dugnoille B, Dauchot JP, Hecq M
Thin Solid Films, 248(2), 220, 1994 |
| 9 |
Dielectric-Properties of AlN Films Prepared by Laser-Induced Chemical-Vapor-Deposition
Li X, Tansley TL, Chin VW
Thin Solid Films, 250(1-2), 263, 1994 |
