연구자 : 채규호 (전남대학교)
No. | Article |
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1 |
Synthesis of Cyclic Diepoxide - HALS Addition Polymers and Their Photostabilizing Effects on Styrenic Polymers Chae KH, Kim JH Macromolecular Research, 18(2), 170, 2010 |
2 |
Positive-Type Photosensitive Polyimide Based on a Photobase Generator Containing Oxime-Urethane Groups as a Photosensitive Compound Jang YM, Seo JY, Chae KH, Yi MH Macromolecular Research, 14(3), 300, 2006 |
3 |
A One-Component Negative Photoresist Based on an Epoxy Terpolymer Containing Oxime-Urethane Groups as a Photobase Generator Chae KH, Park JH Macromolecular Research, 12(4), 352, 2004 |
4 |
아크릴산 저장 안정성 및 Diacrylic acid 생성에 관한 연구 손지숙, 박광명, 송종근, 이찬영, 송희봉, 노동덕, 김대중, 채규호 Journal of the Korean Industrial and Engineering Chemistry, 13(1), 99, 2002 |
5 |
HALS 그룹을 가진 새로운 고분자형 자외선 안정제의 합성 및 특성 김한식, 채규호 Polymer(Korea), 25(5), 625, 2001 |