화학공학소재연구정보센터
연구자 : 채규호 (전남대학교)
No. Article
1 Synthesis of Cyclic Diepoxide - HALS Addition Polymers and Their Photostabilizing Effects on Styrenic Polymers
Chae KH, Kim JH
Macromolecular Research, 18(2), 170, 2010
2 Positive-Type Photosensitive Polyimide Based on a Photobase Generator Containing Oxime-Urethane Groups as a Photosensitive Compound
Jang YM, Seo JY, Chae KH, Yi MH
Macromolecular Research, 14(3), 300, 2006
3 A One-Component Negative Photoresist Based on an Epoxy Terpolymer Containing Oxime-Urethane Groups as a Photobase Generator
Chae KH, Park JH
Macromolecular Research, 12(4), 352, 2004
4 아크릴산 저장 안정성 및 Diacrylic acid 생성에 관한 연구
손지숙, 박광명, 송종근, 이찬영, 송희봉, 노동덕, 김대중, 채규호
Journal of the Korean Industrial and Engineering Chemistry, 13(1), 99, 2002
5 HALS 그룹을 가진 새로운 고분자형 자외선 안정제의 합성 및 특성
김한식, 채규호
Polymer(Korea), 25(5), 625, 2001