연구자 : 김창구 (아주대학교)
| No. | Article |
|---|---|
| 1 |
고밀도 C4F8 플라즈마에서 증착된 불화탄소막의 광학적 및 전기적 특성 권혁규, 유상현, 김준현, 김창구 Korean Chemical Engineering Research, 59(2), 254, 2021 |
| 2 |
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas Kim JH, Kim CK Korean Journal of Chemical Engineering, 37(2), 374, 2020 |
| 3 |
유연전극을 이용한 대기압 부유전극 유전체 장벽 방전 플라즈마 김준현, 박창진, 김창구 Korean Chemical Engineering Research, 57(3), 432, 2019 |
| 4 |
백금 나노입자 전착의 전기화학적 분석 이혜민, 조성운, 김준현, 김창구 Korean Chemical Engineering Research, 53(5), 540, 2015 |
| 5 |
Bosch 공정에서 Si 식각속도와 식각프로파일에 대한 Ar 첨가의 영향 지정민, 조성운, 김창구 Korean Chemical Engineering Research, 51(6), 755, 2013 |
| 6 |
Hydrothermal synthesis of one-dimensional tungsten oxide nanostructures using cobalt ammonium sulfate as a structure-directing agent Rajagopal S, Lee HM, Lee K, Kim CK Korean Journal of Chemical Engineering, 30(10), 1833, 2013 |
| 7 |
Electroless deposition of NiMoP films using alkali-free chemicals for capping layers of copper interconnections Lee HM, Chae H, Kim CK Korean Journal of Chemical Engineering, 29(9), 1259, 2012 |
| 8 |
Preparation and characterization of the electrodeposited Ni-Co oxide thin films for electrochemical capacitors Kandalkar SG, Lee HM, Seo SH, Lee K, Kim CK Korean Journal of Chemical Engineering, 28(6), 1464, 2011 |
| 9 |
Comparison of amine-functionalized mesoporous silica particles for ibuprofen delivery Lee K, Lee D, Lee H, Kim CK, Wu Z, Lee K Korean Journal of Chemical Engineering, 27(4), 1333, 2010 |
| 10 |
Characteristics of electrodeposited CoWP capping layers using alkali-metal-free precursors Namkoung YM, Lee HM, Son YS, Lee K, Kim CK Korean Journal of Chemical Engineering, 27(5), 1596, 2010 |
| 11 |
Film properties of nitrogen-doped polycrystalline silicon for advanced gate material Woo SH, Kim YW, Um PY, Lee HM, Kim CK Korean Journal of Chemical Engineering, 26(3), 824, 2009 |
| 12 |
Alkali 물질이 포함되지 않은 화학물질을 이용한 Co 합금박막의 무전해도금 김태호, 윤형진, 김창구 Korean Chemical Engineering Research, 45(6), 633, 2007 |
| 13 |
Comparison of atomic scale etching of poly-Si in inductively coupled Ar and He plasmas Yun HJ, Kim TH, Shin CB, Kim CK, Min JH, Moon SH Korean Journal of Chemical Engineering, 24(4), 670, 2007 |
| 14 |
Ion Dynamics in Plasma Processing for the Fabrication of Ultrafine Structures Kim CK Korean Journal of Chemical Engineering, 22(5), 762, 2005 |
| 15 |
Analysis of Langmuir Probe Data in High Density Plasmas Kim CK Korean Journal of Chemical Engineering, 21(3), 746, 2004 |
| 16 |
Trajectories of Ions inside a Faraday Cage Located in a High Density Plasma Etcher Ryu JH, Cho BO, Hwang SW, Moon SH, Kim CK Korean Journal of Chemical Engineering, 20(2), 407, 2003 |