| 초록 |
Here, we provide a simple and fast methodology to induce morphological transition of poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs via combined annealing method consisting of solvothermal and immersion annealing steps. Particularly, we place an emphasis on understanding how the above-mentioned combined annealing method affects directed self-assembly of high-χ PS-b-PDMS. We also found optimum morphological transition condition, showing well-defined nanostructures within short annealing time (＜ 10 min). Furthermore, we accomplish morphological transition of well-ordered 15 nm line and 20 nm dot structures during periodic combined annealing process. These results could extend to other BCPs, providing a guideline to effectively manipulate morphologies of nanostructures for the advanced patterning technology. |
