| 초록 |
Nanoimprint lithographay (NIL) is a high throughput, high resolution pattering method in which a surface pattern of a stamp is replicated into a material by mechanical contact. NIL has been applied in various industry fields such as light emitting diodes, solar cells and displays. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, wire-grid pattern fabricated by NIL are used to improve overall efficiency of devices in that fields. Among them, in this study, sub-micron-scaled functional patterns were directly fabricated for micropolarizer array on polymer and glass substrates using UV curable monomers with reactive moieties. Through UV curing NIL process, arrays of nano-scaled wire-grid patterns were successfully fabricated. The feature size of nano structure both mold and replica was investigated by atomic force microscopy (AFM) and Scanning electron microscope (SEM). FTIR spectroscopy was performed to measure the curing rate of monomers. |
