| 학회 |
한국고분자학회 |
| 학술대회 |
2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터) |
| 권호 |
41권 1호 |
| 발표분야 |
분자전자 부문위원회 I |
| 제목 |
Al2O3/HfO2 Moisture Barrier films on Polymer grown by Plasma-Enhanced Atomic Layer Deposition |
| 초록 |
The organic materials and electrodes are damaged by permeation of water vapor and oxygen. The application fields for thin inorganic gas barrier films deposited on polymers cover a wide and diverse area of application such as food, pharmaceutical, medical, and organic electronics packaging. In this study, we aimed to prepare Al2O3/HfO2 nanolaminate (NL) thin films consisting of alternately stacked atomic sublayers with excellent water resistance, high transparency, low gas permeation, and low-temperature processing. We determined the structural characteristics of the Al2O3/HfO2 NL films and investigated the physical properties of the films as barriers to water corrosion and gas permeation. |
| 저자 |
김래호, 장진혁, 박선욱, 정용진, 백용화, 박찬언
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| 소속 |
포항공과대 |
| 키워드 |
thin film encapsulation; plasma-enhanced atomic layer deposition; Al2O3/HfO2 nanolaminate film
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| E-Mail |
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