| 초록 |
Thermal nanoimprint has been used for fabricating optical, electronic, and organic devices. One inherent problem with the nanoimprint is the residual layer that remains after the imprint. In this talk, we present design rules for preparing mold that are necessary for inhibiting polymer instabilities in the condition of no residual layer after imprint. These rules are constraints on mold dimensions and are derived from dewetting considerations rather than polymer layer thickness, although there are also restrictions on polymer thickness for meeting the prerequisite. Also we will demonstrate nanoimprint with deformable elastomeric mold to generate self-modulating polymer resist patterns without residual layers and film instability. A constraint on the coated polymer layer thickness was derived in order to ensure that there is no residual layer left after patterning and at the same time that film stability is guaranteed without film dewetting within the cavity. |
