| 초록 |
Directed self-assembly (DSA) of block copolymers (BCPs) can generate uniform and periodic patterns within guiding templates, and has been one of the promising nanofabrication methodologies for resolving the resolution limit of optical lithography. However, one of the critical challenges of DSA is long annealing time (up to several hours), resulting in a low throughput. Here, we demonstrate an approach to achieve both ultrahigh resolution (＜ 10 nm) and short processing time using thermally-assisted solvent annealing. Well-ordered various morphologies such as spheres, perforated lamellae, and lamellae with sub-20 nm dimensions can be obtained within 30 minutes using mixed solvent vapors. Moreover, sub-10 nm line patterns can be perfectly ordered in topographic template for only one minute by the fast swelling of BCPs. This useful method will provide a new opportunity for next-generation nanolithography applications. |
