| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
A versatile patterning method for 3-dimensional complex pattern with 10nm scale over large area by secondary sputtering phenomenon |
| 초록 |
The development of large-area nano-patterning with high resolution, high aspect ratio and simple process scheme/cost is a challenging work for realizing their potential applications in opto-electronics and nano-biotechnology such as nanoelectronics, optics, optical sensing, light-emitting devices and bio-sensing devices. Unlike previous nano-fabrication techniques reported thus far, our method has several powerful advantages such as high resolution(~10nm) and high aspect ratio(~15), easy fabrication process over large area, wide range of materials available, 3-dimensional complex nano-structure and easy controlling of pattern feature. Thus, our novel patterning technology will be able to introduce new concepts for fabricating high performance of future nanoscale devices. |
| 저자 |
전환진, 김종선, 김경환, 백연경, 김대우, 최종길, 이지선, 정희태
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| 소속 |
KAIST |
| 키워드 |
pattern; ion bombardment; nano; etching
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| E-Mail |
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