| 학회 | 한국재료학회 |
| 학술대회 | 2013년 가을 (11/06 ~ 11/08, 제주롯데호텔) |
| 권호 | 19권 2호 |
| 발표분야 | A. 전자/반도체 재료(Electronic and Semiconductor Materials) |
| 제목 | Fabrication of (K,Na,Li)(Nb,Ta)O3 Thick Film for High Density Capacitor by Aerosol Deposition |
| 초록 | Lead-free dielectric has been widely studied according to environmental regulations in Europe. Lead-free (K,Na,Li)(Nb,Ta)O3 Ceramics can be used at wide temperature range due to high Curie temperature. Besides high permittivity of KNLNT cause expectation to exhibit high energy density characteristic. High density capacitor has been interesting field at military, motor and medical industry etc. The most commonly used dielectric is polymer such as polypropylene, but its low permittivity require a large volume circuit. Because of this drawback, ceramics dielectric with high permittivity has been studied. In this study, we manufactured KNLNT Ceramics by the aerosol deposition method and characterized energy density property. |
| 저자 | Soohwan Lee1, Jungkeun Lee2, Min-Geun Choi3, Jungho Ryu4, Dong-Soo Park1, Dae-Yong Jeong2 |
| 소속 | 1School of Materials Engineering, 2Inha Univ., 3Incheon 402-751, 4Korea |
| 키워드 | Aerosol deposition; ; High energy capacitor |
