| 초록 |
Titanium dioxide thin films were grown by atomic layer deposition using tetrakis-dimethylamino titanium (TDMAT) and H2O2 as precursor and reactant, respectively. The films were grown at deposition temperature 100-250℃. Influence of experimental parameters; precursor, reactant and purge time, on thin films properties and photocatalism were studied. Various analysis methods were used to investigate the film properties, ellipsometer, four-point probe, X-ray diffractometer and Auger electron spectometer. |
