| 학회 |
한국공업화학회 |
| 학술대회 |
2016년 가을 (10/26 ~ 10/28, 제주국제컨벤션센터(ICCJEJU)) |
| 권호 |
20권 2호 |
| 발표분야 |
고분자_포스터 |
| 제목 |
Preparation of silver ion containing printing ink and silver patterning with E-beam irradiation modification |
| 초록 |
It is difficult to prepare organic polymers containing metal ions because of its low affinity between organic and inorganic substances. In this study, to overcome this problem we synthesized methacrylic monomer which concluded silver ion as a metal precursor. Polymer containing silver ion was prepared by radical polymerization between the monomer containing silver ion and methyl methacrylate(MMA). MMA was applied to enhance properties of synthesized polymer. Fabricated polymer was utilized as ink by adjusting the ratio between solvent and cosolvent. The ink containing silver ion was also able to be applied at general ink jet printer. Printed pattern by ink jet printer on OHP film was irradiated with electron beam for silver ion reduction. E-beam condition was determined by experimental that was carried out with adjusting E-beam current and time. |
| 저자 |
남한솔, 김효진, 이경진
|
| 소속 |
충남대 |
| 키워드 |
patterning; silver ion; polymerization
|
| E-Mail |
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