| 초록 |
ALD/PECVD are applied as the hybrid multilayer, which has property for the moisture barrier for the thin film encapsulation of flexible OLEDs. Plastic substrate was used for the substrate, n-hexane, furan, HMDSO as the organic layers ,Al2O3, ZrO2 and nanolaminate structure as inorganic layers. we used the PEN film as the plastic substrate. The inorganic layers thin films were deposited on the substrates by using TMA(Tri-Methyl Aluminum ), TEMAZ(Tetra ethylmethyl amino zirconum) with H2O as inorganic precursors and Ar gas was used as a purging gas. The TMA, TEMAZ and water were vaporizedat 5℃, 60℃ and room temperature for delivering to the deposition chamber. The inorganic layer thin film was grown at temperatures of 80℃under a pressure of 300mtorr. The organic layer was deposited by plasma-CVD method and room temperature, respectively. The samples were analyzed for their thickness, water contact angle, surface roughness, bending properties and WVTR. The WVTR was measured in a constant temperature & humidification chamber, To measure WVTR, we set the condition of the temperature 85℃and relative humidity 85%. |
