| 학회 |
한국재료학회 |
| 학술대회 |
2004년 가을 (11/05 ~ 11/05, 인하대학교) |
| 권호 |
10권 2호 |
| 발표분야 |
반도체I(실리콘) |
| 제목 |
UV 차단 금속막(hybrid mold mask)을 이용한 잔류층이 없는 UV-nanoimprint patterning에 관한 연구 |
| 초록 |
Nanoimprint lithography (NIL) has been developed intensively for many application, such as the production of optical waveguides, optical discs, aspherical lenses for laser-light pens, etc. We propose a new approach to greatly simplify the fabrication of conventional NIL using a combined nanoimprint and photolithography (CNP) patterning technique. We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking metal layer placed on top of the mold protrusions. NANOSIS610 (NNDTM) was used as an imprinting tool with a pressure vessel type imprinting system that has a unique the isotropic pressure system for uniform pressing over large area (up to 6 inch in diameter) and effective delivery of pressing force. We use a negative tone photo resist (PR) with higher selectivity to substrate instead of UV curable monomer and thermal plastic polymer that are commonly used in NIL. In the CNP technique with HMM the "residual layers" is chemically removed by developing process. Thus the RIE process which is essential in conventional NIL to remove residual layer can be eliminated. The HMM and replicated patterns were observed by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). |
| 저자 |
신수범1, 안진호1, 문강훈1, 이 헌2, 곽신웅3, 차한선4
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| 소속 |
1한양대, 2고려대, 3NND Co. Ltd, 4Seoul |
| 키워드 |
nano imprint; UV; patterning; NIL
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| E-Mail |
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