| 초록 |
Block copolymer (BCP) self-assembly has achieved great advances in nanotechnology over the past several decades. The precise control of interfacial properties in BCP thin films is crucial to obtain a perpendicular domain orientation in nanopatterning. Herein, the effective and universal interfacial engineering of polymeric nanomosaic (PNM) coating is introduced. The PNM patterns derived from the air/water interfacial self-assembly of BCPs can be tuned with a few-nm-resolution and transferred to substrates, which enables accurate control of surface energy of the substrates. Overlying BCPs on the PNM coated substrates successfully self-assembled to have a perpendicular domain orientation. The PNM coating can be applied to curved, flexible, and three-dimensional substrates in an extensive spectrum of materials. Furthermore, the PNM can be utilized as an etching-free, shear-inducible, and reusable topcoat imparting free surface neutralization for the high-chi BCP thin films. |
