| 초록 |
Self-assembly of block copolymers (BCPs) is attractive for many potential applications such as porous membranes, anti-reflective coating and electrical devices. Among them, polystyrene-b-poly dimethylsiloxane(PS-b-PDMS) copolymers are widely used due to high etch selectivity from silicon containing PDMS block to oxygen plasma, and sub-10 nm patterns from high χ parameter between two domains. However, PS-b-PDMS hardly presents perpendicular orientation because of huge difference of surface tension between PS and PDMS blocks, so that PDMS domain with low surface tension locates at the surface. We introduce here top coating layer on PS-b-PDMS which neutralizes interfacial energy between each copolymer blocks. As PS-b-PDMS undergoes phase separation with solvent annealing, for energy minimization, PS-b-PDMS constructs perpendicularly oriented nano-structure in a large area. |
