| 초록 |
In this study, we introduced a highly efficient patterning technique for fabricating variety of complex 3D nanop-patterns from a several hundred nanometer-scale new approach to nano-structuring termed “secondary sputtering lithography (SSL)”, which enables the fabrication of 10 nm-scale 3D patterned nanostructures with high aspect ratios over large areas by utilizing plasma ion-etching process. This new technique utilizes the secondary sputtering phenomenon, wherein target material particles are emitted by accelerated Ar+ ions over a large angular distribution, leading to the fabrication of 10nm scale high-resolution patterns without complicated equipment. Also, we developed advanced SSL technique that can precisely control resolution from ten nanometers to a few hundred nanometers by combining the plasma ion process and electroplating method. |
