| 학회 | 한국고분자학회 |
| 학술대회 | 2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 | 36권 1호 |
| 발표분야 | 반도체용 고분자소재 |
| 제목 | New approach for adhesion of UV coating by plasma polymerization at atmospheric pressure |
| 초록 | Generally, properties of surface were distinguished by hydrophilic, hydrophobic, and super-hydrophobic surface. But these properties are different property with adhesion. In this study, therefore, surface modification with improved adhesion was investigated by plasma polymerization coating of hydrocarbon mixture. The surface with improved adhesion was modified with radio-frequency (RF) plasma generation under atmospheric pressure. |
| 저자 | 지영연, 김성락 |
| 소속 | 트리플코어스 |
| 키워드 | SiH4; plasma; etching; semiconductor |
