| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
방사광을 이용한 고분자 나노소재 연구 |
| 제목 |
Soft-Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement |
| 초록 |
Soft-graphoepitaxy as a novel strategy for nanopatterning utilizes the disposable photoresist confinement prepared by conventional DUV photolithography to direct block copolymer assembly. The soft-graphoepitaxy provides an efficient and scalable route to various functional nanostructures such as metal and semiconductor nanowire arrays, replicating highly ordered block copolymer thin film morphology whose nanoscale assembly is directed by a disposable topographic pattern of photoresist. Our approach is anticipated to serve as a useful nanolithographic process for complex device architectures requiring multiple layer overlay processing. |
| 저자 |
정성준, 김지은, 문형석, 김봉훈, 신동옥, 김주영, 이진아, 김상욱
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| 소속 |
카이스트 |
| 키워드 |
Block copolymer; Nanolithography; Graphoepitaxy; Photoresist
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| E-Mail |
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