화학공학소재연구정보센터
학회 한국재료학회
학술대회 2009년 가을 (11/05 ~ 11/06, 포항공과대학교)
권호 15권 2호
발표분야 C. Energy and the Environment(에너지 및 환경재료)
제목 Thermal Behavior of Frits Under Fast Firing
초록 RTP (Rapid thermal processing) is applied to the semiconductor manufacturing process. To fabricate Si solar cells, RTP is also used with the merit of low cost and mass production. Ag pastes are printed on the front of Si wafer and the screen printed contact between Ag electrodes and Si wafer is formed during a fast firing by using RTP. During a fast firing, thermal behaviors of frits with increasing temperatures greatly affect the electrical properties of Si solar cells and Ag electrodes. In this study, when a fast heating is applied to the firing of frits, thermal behaviors of frits were studied. Viscous flows of frits with different heating rates from 10oC/min. to 400oC/min. were first measured using a rapid thermal annealing system. To compare the thermal behaviors of frits sintered with different heating rates, the microstructures of frits sintered were measured using scanning electron microscopy.  Thermal behaviors of frits and microstructures of frits sintered during firing ultimately influence the electrical properties of Ag electrodes. These preliminary studies of frits sintered under the fast heating rates show the difference of thermal behaviors of frits and how viscous flows of frits with different heating rates change. These results will be helpful for understanding thermal behaviors of frits during a fast heating in RTP.
저자 김동선, 황성진, 김형순
소속 인하대
키워드 Fast firing; Frit; Thermal behavior
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