| 초록 |
We introduce soft graphoepitaxy, a cost-effective, truly scalable, ultralarge-area block copolymer lithography. Soft graphoepitaxy employs a disposable photoresist prepattern attainable by conventional lothography, such as ArF lithography or I-line litography, to direct lateral nanodomain ordering in blcok copolymer thin films. Since the organic photoresist prepattern is readily disposable, this approach provides laterally ordered self-assembled nanopatterns and corresponding pattern transfeerred functional nanostructures without any trace of the structure directing prepattern. Furthermore, the microscale photoreist pattern can be transformed into a sub-30 nm scale ultrafine lamellar pattern over an arbitrary large area via a scalable soft-graphoepitaxy principle. |
