초록 |
Self-assembly of block copolymers(BCPs) which can generate various nanostructure from micro-phase separation has become one of the most competitive approaches for the formation nanostructure. Nanostructures such as lamellar, cylindrical, or spherical structures that are available to BCPs are determined by the composition, volume fraction and incompatibility of copolymer components. In this work, we chose PS-b-PDMS and PS-b-PEO. PS-b-PDMS have a high etch selectivity and high Flory-Huggins parameter χ while PS-b-PEO have a high degree of lateral ordering after solvent annealing. By taking advantage of the features of two BCPs, they were mixed and coated on the Silicon wafers. The solvent annealing process was carried out to control the orientation and ordering of the nanostructure thin film. At a final step, reactive ion etching process produced silica nanostructure along the BCP nanodomains. This provides simple route to create inorganic oxide nanostructure for practical application. |