| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 봄 (04/09 ~ 04/10, 고려대학교) |
| 권호 | 29권 1호, p.143 |
| 발표분야 | 복합재료 |
| 제목 | Fabrication of metal dot and hole array using colloidal assembly |
| 초록 | To create large-area, high-resolution nanostructures, various alternative techniques have been developed. The use of "colloidal assembly" to pattern nanostructures is one of the most active research areas in today's materials science community. There are many advantages of using colloidal assembly for building nanostructures, including lower cost, higher speed, more flexibility, and easier implementation. Soft materials such as colloidal particles, block copolymers, DNAs, and proteins can be used to create templates for patterning nanostructures through self-assembly processes. We fabricated silicon and metal nanostructure array in the range of 10-50 nm using by PS or PMMA particles, metal sputtering, RIE etching. It is possible to be used for stamp in nanoimprint lithography. |
| 저자 | 김사라1, 최대근1, 정종률2, 양승만1 |
| 소속 | 1한국과학기술원 생명화학공학과, 2한국과학기술원 물리학과 |
| 키워드 | |
