| 초록 |
The transparent dielectric requires high luminescence efficiency, and low dielectric constants in plasma display panel (PDP). It has been made from the PbO glass system. However, new dielectric material is needed to develop because of low power consumption and environment pollution. Polycarbosilane (PCS) has been studied due to its low dielectric constants and good manufacturing property. Furthermore, the polycarbosilane can turn into various materials as a SiC, SiOH, and SiO2 according to the firing, which is under a controlled atmosphere. In this study, we have attempted to use a thick film, which is from PCS, PCS + TEOS, and PCS + nano silica, instead of the PbO glass system. The thick film was made by a spin coating and a dip coating method on a glass substrate and Si wafer. After making a film, the transmittance of thick film was determined using an UV-visible spectroscopy. And the dielectric constant of thick film was determined by a dielectric spectrometer. The thick film showed the transmittance is more than 75% and the dielectric constant is lower than that of PbO glass system. Based on the result, the thick films of the PCS and the composites can be applied to a transparent dielectric in PDP. |
