| 초록 |
In the current work, we introduced Fluorine contents in organic-inorganic nanohybrid system and fabricated the moisture barrier films using plasma enhanced atomic layer deposition (PEALD) based Al2O3 and sol-gel based fluorinated hybrid material (FHM) with hybrid thin film encapsulation (TFE) type for optoelectronics. From systematic analysis on the FHM film on various substrate, it is revealed that FHM films full covers all parts of substrate with low roughness and shows high hydrophobicity and good flexibility. These results demonstrate that the FHM is able to protect Al2O3, generally known as corrosive toward water. Therefore, the TFE with Al2O3 and FHM showed excellent barrier film characteristics as low as 6.33 x 10-5 g m-2 day-1s at accelerated condition (60 ℃ and 90 % RH) and high visible transmittance above 95 % in 4 pairs. |
