| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO)) |
| 권호 |
40권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Positive type photosensitive polyimide patterning: Effect of photo acid generator(PAG) |
| 초록 |
Photosensitive polyimides are materials that can simplify the patterning process by adding photosensitive functionality to the conventional polyimides. We prepared a series of positive type photosensitive polyimide formulation by varying a photo acid generator. Alkali soluble polyhydroxyimide (PHI) and di-vinyl ether type cross-linker were chosen as a photosenstive polyimide precursor and a dissolution inhibitor, respectively. The PHI has been synthesized by ring opening addition of 4,4′-hexafluoroisopropylidenebis(phthalic anhydride) (6FDA) and 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (6FHAB) and subsequent thermal cyclization. Cross-linker was also obtained by reacting bisphenol A with 2-chloroethyl vinyl ether in the presence of strong inorganic base, NaOH. In this presentation, we will discuss the effect of photo acid generators on the photo patterning of positive type photosensitive polyimide in terms of photosensitivity of PAG to the UV light. |
| 저자 |
김진수, 이미혜, 원종찬, 이성구, 가재원, 도선정
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| 소속 |
한국화학(연) |
| 키워드 |
Polyimide; Photosensitive Polyimide; Photo acid generator; Positive type
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| E-Mail |
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