| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Large-Area, Highly Aligned Lamellar Block Copolymer by Surface Parallel Cylinder Patterns |
| 초록 |
We achieved arbitrary large-area directed self-assembly of 20nm scale block copolymer lamellar patterns from conventional I-line lithography. A high oriented nanoscale cylinder array was graphoepitaxially assembled within 1um-width photoresist trenches prepared by I-line lithography. The subsequent spin casting of lamellar block copolymer film and thermal annealing over the graphoepitaxy morphology attained a highly aligned surface perpendicular lamellar pattern epitaxially registered by the underlying cylinder pattern. |
| 저자 |
문형석, 진형민, 김봉훈, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
Block Copolymer; Surface Parallel Cylinder; Graphoepitaxy;
|
| E-Mail |
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