| 학회 | 한국화학공학회 |
| 학술대회 | 2014년 봄 (04/23 ~ 04/25, 창원컨벤션센터) |
| 권호 | 20권 1호, p.71 |
| 발표분야 | 공업화학 |
| 제목 | Cleaning system study with mounting activated species of solution using atmospheric pressure plasma |
| 초록 | A up-to-date semiconductor and display manufacturing process must require technology to reduce defective product recently. but cleaning process used chemical solution is comprising very harmful substance for the human body and environment. Throughout the world, many studies have been conducting with the trend by restricting in the environment in all the fields including Cleaning due to the pollution. The aim of research is more removal efficiency and environment-friendly than existing method to remove minute particle when manufacturing semiconductor, display and something else by reducing chemical solutions, ultrapure water and gas. Our experiment uses atmospheric pressure plasma and cleaning solutions utilizing gas-liquid hybrid system at the same time. It has been increasing for activated species to mount a effectivity using electron and ion which plasma reactor of self-production generate and analysis utilizing Ozone analyzer, OES(Optical Emission Spectroscopy), DMP solution, UV/VIS spectroscopy. |
| 저자 | 권흥수, 이원규 |
| 소속 | 강원대 |
| 키워드 | Plasma; activated species; chemical solution; cleaning process |
| 원문파일 | 초록 보기 |
