| 초록 |
Block copolymers (BCPs) self-assembly which has advantages of excellent resolution, process simplicity, pattern tunability and cost-effectiveness can effectively create diverse nanostructures in the size range of 5-50 nm such as dot, line, hole, and ring patterns. Hence, BCP self-assembly is considered as one of the most potential candidates for next-generation lithography applications. However, there are critical obstacles to achieve fast pattern formation of BCPs with a high Flory-Huggins interaction parameter (χ). In this study, to solve this concern, we employed PS-homopolymer (hPS) blend methodology for poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs with high-χ. We systemically explored how PS-b-PDMS/hPS blends affect BCP self-assembly kinetics. We found the optimum mixing ratio of the blends for the hPS/PS-b-PDMS BCPs with different molecular weights (MWs) and volume fraction (fPDMS), showing fast pattern formation time (＜ 5 min) to get highly ordered nanostructures. In addition, we also investigated how PDMS-homopolymer (hD) and binary homopolymers (hPS/hD) affects the self-assembly kinetics of PS-b-PDMS BCP compared to the hPS. Moreover, we compared the self-assembly speed of PS-b-PDMS BCP with high-χ and PS-b-PFS BCP with low-χ, showing similar effect on the self-assembly kinetics. We believe that this effective and useful approach may be extendable for the other BCP systems, contributing to future BCP lithography. |
