| 초록 |
Polyhedral oligomeric silsesquioxane (POSS) derivatives have recently received much attention such in electronic, biological and aerospace applications, biological and due to high hydrophobicity, non-toxicity, and good mechanical and thermal properties. Poly(methyl methacrylate) (PMMA) is the one of the most commercial polymers, it has good chemical resistance, processability, weather resistance and transparency. In this research, a series of copolymers were synthesized, composed of methyl methacrylate and POSS-methacrylate moieties via free radical polymerization and abbreviated to MCP#(# means weight percentage of MA-POSS moiety of each copolymer). A sort of analysis were carried out, especially the surface properties of the polymers were systemically correlated with the results. |
