| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
고분자가공/복합재료－나노카본 고분자 복합필름 |
| 제목 |
The control of feature and size for 3-dimensional patterned structures of secondary sputtering lithography by plasma and PS conditions. |
| 초록 |
Several approaches towards control of nano-structued pattern have been exploited through various lithographic techniques such as colloidal lithography, soft lithography and building block based lithography. Here, we demonstrate a new control method for novel patterning technology "secondary sputtering lithography" enabling to fabricate the high resolution of 3-dimensional complex nanoscale patternsby using simple plasma conditions and PS concentration. By applying the simple phenomenon for PS 3-dimensional changes according RIE conditions to secondary sputtering lithography, we fabricate the various 10nm scale 3-dimensional pattern with different shapes and sizes very simply. |
| 저자 |
전환진, 김종선, 김경환, 유해욱, 이지선, 최종길, 정희태
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| 소속 |
KAIST |
| 키워드 |
나노패터닝 |
| E-Mail |
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