| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 봄 (04/12 ~ 04/13, 서울대학교) |
| 권호 |
27권 1호, p.312 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
A Study on Negative-type Photosensitive Polyimide Precursor Developable with Aqueous Alkaline Solution |
| 초록 |
Novel negative type photosensitive polyimide(PSPI) precursor developable with aqueous alkaline solutions(TMAH) was synthesized, which can be used for interlayer insulation layer in liquid crystal display device. In this study, we had prepared polyimide precursor from CBDA(1,2,3,4-tetracarboxy cyclobutane dianhydride) and 2'-(methacryloyloxy)ethyl 3,5-diamino benzoate. This negative working polyimide showed remarkable solubility difference toward aq. TMAH(2.38%) when exposed to UV light. Properties required for insulation layer such as transparency, dielectric constant, chemical resistance were investigated.
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| 저자 |
심종천1, 최길영2, 김정수*3, 김광규**, 김경준**, 이미혜
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| 소속 |
1한국화학(연), 2*충남대, 3**(주) LG 화학 기술(연) |
| 키워드 |
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| E-Mail |
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