화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2020년 가을 (10/05 ~ 10/08, 부산컨벤션센터(BEXCO))
권호 45권 1호
발표분야 고분자합성
제목 Synthesis and Properties of PBO for Positive Photo Resist According to Various End Cappers  
초록 Polybenzoxazole was synthesized by polymerizing various polyhydroxyamide precursors and it was confirmed that Pattern performed well using SEM which was confirmed to be synthesized using FT-IR and FT-NMR. PHA was synthesized using 0.2 eq of phthalic, Succinic anhydride, and maleic anhydride was synthesized at 0.1, 0.2, 0, 3 eq. All PHA synthesized was well dissolved in a flying solvent such as NMP, DMAc, DMSO. All synthesized PHAs were well dissolved in solvents such as NMP, DMAc, DMSO and others. The silicon wafer was fabricated at 3 cm x 3 cm and spin coated at 1000 rpm for 50 sec. Prebake was at 130 ~ 150 ℃ for 5 minutes. Aligner uses MIDAS's MDA-400S and give energy of 450 mJ using the 365 nm I-line wavelength. Develop was carried out using tetramethylammonium hydroxide aqueous solution 2.38%, and the development time was adjusted in order to form the best line.
저자 강인수, 신요섭, 이승우
소속 영남대
키워드 PR; PI
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