| 초록 |
We show surface energy-tunable polymeric molds for nano-imprint lithography. The mold is highly robust, transparent, has a minimized haze, does not contain additives which cause optical defects, and based on a non-fluorinated polymer. By modulating the composite ratio of the polymer precursor, the cross-linking density, mechanical modulus, and surface energy, can be controlled. To evaluate these properties of the molds, we also characterized the surface energy by measuring the contact angles and calculating the work of adhesion between various things such as the silicon wafer, polymer film, and mold for successful detaching in nano-imprint lithography process for fabrication of nanoscale structures. Furthermore, the molds showed high optical transparency (about 92.54 % in visible light region) and precisely tunable mechanical and surface properties, realizing replicate sub-100 nm patterns with by thermal LP-NIL(Low Pressure-Nano Imprint Lithography) and UV-NIL. |
