| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
Molecular Self-Assembly from Small Molecules and Liquid Crystals to Macromolecules |
| 제목 |
Disposable Photoresist Prepatterning Lithography of Ultralarge-Area Block Copolymer |
| 초록 |
We accomplished low cost, truly scalable, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area. |
| 저자 |
백정은, 김주영, 문형석, 김상욱
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| 소속 |
한국과학기술원 |
| 키워드 |
block copolymer; self-assembly; lithography; graphoepitaxy ·
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| E-Mail |
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