| 학회 |
한국재료학회 |
| 학술대회 |
2015년 봄 (05/14 ~ 05/15, 구미코) |
| 권호 |
21권 1호 |
| 발표분야 |
G. 나노/박막 재료 |
| 제목 |
5-nm-scale Line and Hole Patterning by Synergistic Integration of Block Copolymer Nanopatterning withe Atomic Layer Deposition |
| 초록 |
We demonstrate 5-nm-scale line and hole patterning by synergistic intergration of block copolymer (BCP) nanopatterning with atomic layer deposition (ALD). While directed self-assembly of BCPs generates highly ordered line array or hexagonal dot array with the pattern periodicity of 28 nm and the minimum feature size of 14nm, pattern density multiplication employing ALD successfully reduced the pattern periodicity down to 14 nm and minimum feature size of 5nm. Self0limiting ALD process enabled the low temperature, conformal deposition of 5 nm thick spacer layer directly at ths surface of organic BCP patterns. This ALD assisted pattern multiplication addresses the intrinsic thermodynamic limitation of low χ BCPs for suv-10-nm scale downscaling. Moerever, this approach offers a general strategy for scalable ultrafine nanopatterning without burden for multiple overlay control and high cost lithographic tools. |
| 저자 |
장재호1, 박귀용2, 남대근1, 문형석1
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| 소속 |
1한국생산기술(연), 2금강금속도금(주) |
| 키워드 |
block copolymer; self-assembly; nanopatterning; atomic layer deposition; pattern multiplication; surface treatment
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| E-Mail |
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