| 초록 |
To increase ferroelectric properties of Pb(Zr,Ti)O3(PZT), additional process is necessary. Aerosol deposition (AD) process has been studied for forming coating film at room temperature without any additional heat treatment in low vacuum. Recently, studies have been made to form a coating film of PZT by the AD method. However, coating films formed only of PZT have low energy efficiency due to their low film density and dielectric breakdown strength. In this study, PZT and glass frit(SiO2-Al2O3-Y2O3, SAY) were mixed with various volume ratios(PZT-xSAY, x=0, 5, 10vol%) and coating films were produced on silicon wafers by AD method. Their surface and cross sectional microstructures were observed by scanning electron microscopy. Polarization-electric (P-E) field hysteresis loops of the coating films at room temperature were investigated via a ferroelectric tester equipped with a high voltage interface. The results showed that the microstructure of coating films was formed more dense as glass was added. In addition, depending on the ratio of PZT and glass frit, dielectric breakdown strength and energy storage characteristics changed. |
